Optimization of polarization aberration for NA1.35 lithographic projection optical system

LI Jie; LIN Wumei; LIAO Zhijie

doi:10.5768/JAO201940.0401008

Journal of Applied Optics > 2019 > 40(4): 575-582. > DOI: 10.5768/JAO201940.0401008

LI Jie, LIN Wumei, LIAO Zhijie. Optimization of polarization aberration for NA1.35 lithographic projection optical system[J]. Journal of Applied Optics, 2019, 40(4): 575-582. DOI: 10.5768/JAO201940.0401008

Citation:

PDF (405 KB)

Optimization of polarization aberration for NA1.35 lithographic projection optical system

LI Jie^{1, 2,},
LIN Wumei¹,
LIAO Zhijie¹

1.
Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610000, China
2.
University of Chinese Academy of Sciences, Beijing 100049, China

More Information

Received Date: January 20, 2019
Revised Date: February 10, 2019

Graphical Abstract

Abstract

Abstract

In order to obtain high imaging quality of numerical aperture(NA)1.35 lithographic projection optical system, except for controlling the wavefront aberration, the polarization aberration also should be optimized during design process. The polarization aberration of NA1.35 lithographic projection optical system was expressed by the use of Jones pupils and physical pupils, and the magnitude of polarization aberration was analyzed with bi-attenuation and retardation. According to the max incident angles of different optical surfaces, corresponding coatings of each optical surface were designed to optimize polarization aberration of optical system. After optimizing coatings, the diattenuation and retardation of NA1.35 lithographic projection optical system decrease to 0.021 8 and 0.057 2 rad separately compared with regular coatings, it means that the polarization aberration of optical system decreases. Using lithographic simulation software Prolith to simulate the lithography performance with regular coatings and optimized coatings separately, the result shows that the image contrast with optimized coatings increases 4.4%, proving the effectiveness of the method for optimizing polarization aberration of NA1.35 lithographic projection optical system.
- optical design,
- polarization aberration,
- thin film optics,
- Jones pupil,
- image contrast

FullText(HTML)

References (15)

References

[1]	贺文俊, 贾文涛, 冯文田, 等.深紫外光刻投影物镜的三维偏振像差[J].红外与激光工程, 2018, 47(8):0818006. http://d.old.wanfangdata.com.cn/Periodical/hwyjggc201808033 HE Wenjun, JIA Wentao, FENG Wentian, et al. Three-dimensional polarization aberration of deep ultraviolet lithographic projection lens[J]. Infrared and Laser Engineering, 2018, 47(8): 0818006. http://d.old.wanfangdata.com.cn/Periodical/hwyjggc201808033
[2]	姚汉民, 胡松, 刑延文.光学投影曝光微纳加工技术[M].北京:北京工业大学出版社, 2006:12. YAO Hanmin, HU Song, XING Tingwen. Optical projection exposure technology of micro and nano fabrication[M]. Beijing: Beijing University of Technology Press, 2006:12.
[3]	李旸晖, 沈伟东, 章岳光, 等.基于琼斯矩阵的薄膜诱导偏振像差分析[J].光学学报, 2010, 30(s): 100109. http://cpfd.cnki.com.cn/Article/CPFDTOTAL-ZGGY201008001234.htm LI Yanghui, SHEN Weidong, ZHANG Yueguang, et al. Analysis of coating-induced polarization aberrations based on Jones matrix[J]. Acta Optica Sinica, 2010, 30(s):100109. http://cpfd.cnki.com.cn/Article/CPFDTOTAL-ZGGY201008001234.htm
[4]	张德福, 李显凌, 芮大为, 等.193 nm投影光刻光学系统光机系统关键技术研究进展[J].中国科学:技术科学, 2017, 47(6):565-S581. ZHANG Defu, LI Xianling, RUI Dawei, et al. Key technology progress of optomechanical systems in 193 nm projection objective[J]. Scientia Sinica Technologica, 2017, 47(6): 565-581.
[5]	孟泽江, 李思坤, 王向朝, 等.光刻投影物镜琼斯光瞳检测方法[J].光学学报, 2019, 39(3):0312004. http://www.wanfangdata.com.cn/details/detail.do?_type=perio&id=gxxb201903023 MENG Zejiang, LI Sikun, WANG Xiangzhao, et al. Jones pupil measurement of lithographic projection lens[J]. Acta Optica Sinica, 2019, 39(3): 0312004. http://www.wanfangdata.com.cn/details/detail.do?_type=perio&id=gxxb201903023
[6]	毕丹丹, 张立超, 时光.浸没式投影物镜光学薄膜[J].中国光学, 2018, 11(5):745-764. http://d.old.wanfangdata.com.cn/Periodical/zggxyyygxwz201805005 BI Dandan, ZHANG Lichao, SHI Guang. Optical coatings for projection objective immersion lithography[J]. Chinese Optics, 2018, 11(5): 745-764. http://d.old.wanfangdata.com.cn/Periodical/zggxyyygxwz201805005
[7]	HUANG Wei, XU Xiangru, XU Mingfei, et al. Polarization aberration function for perturbed lithographic lens[J]. SPIE, 2014, 9272: 92720G. http://www.wanfangdata.com.cn/details/detail.do?_type=perio&id=CC0214741256
[8]	陈卫斌, 顾培夫, 郑臻荣.投影光学系统中的偏振像差分析[J].光学学报, 2005, 25(5):696-700. doi: 10.3321/j.issn:0253-2239.2005.05.027 CHEN Weibin, GU Peifu, ZHENG Zhenrong. Analysis of polarization aberration in projection system[J]. Acta Optica Sinica, 2005, 25(5):696-700. doi: 10.3321/j.issn:0253-2239.2005.05.027
[9]	尚红波, 刘春来, 张巍, 等.膜系引入偏振像差对投影光刻光学系统设计的影响与改进[J].光学学报, 2015, 35(1):0122003. http://www.cnki.com.cn/article/cjfdtotal-gxxb201501040.htm SHANG Hongbo, LIU Chunlai, ZHANG Wei, et al. Effects and improvements of coating induced polarization aberration on lithography lens design[J]. Acta Optica Sinica, 2015, 35(1): 0122003. http://www.cnki.com.cn/article/cjfdtotal-gxxb201501040.htm
[10]	LI Yanqiu, GUO Xuejia, LIU Xiaolin, et al.A technique for extracting and analyzing the polarization aberration hyper-numerical aperture image optics[J]. SPIE, 2013, 9024: 904204. https://www.researchgate.net/publication/261017953_A_technique_for_extracting_and_analyzing_the_polarization_aberration_of_hyper-numerical_aperture_image_optics
[11]	LIU Xiaolin, LI Yanqiu, LIU Ke. Polarization aberration control for hyper-NA lithographic projection optics at design stage[J]. SPIE, 2015, 9618: 96180H. doi: 10.1117/12.2193245.full
[12]	WANG Jingmin, LI Yanqiu. Three-dimensional polarization aberration in hyper-numerical aperture lithography optics[J]. SPIE, 2012, 8326: 832624. http://www.wanfangdata.com.cn/details/detail.do?_type=perio&id=CC0212294381
[13]	GEH B, RUOFF J, ZIMMERMANN J, et al. The impact of projection lens polarization properties on lithographic process at hyper-NA[J]. SPIE, 2007, 6520: 65200F. doi: 10.1117/12.722317.full
[14]	沈学举.透镜偏振像差分析[J].应用光学, 1996, 17(3):6-9. http://www.cnki.com.cn/Article/CJFDTotal-YYGX199603002.htm SHEN Xueju. Analysis on polarizing aberration of lens[J]. Journal of Applied Optics, 1996, 17(3): 6-9. http://www.cnki.com.cn/Article/CJFDTotal-YYGX199603002.htm
[15]	沈学举.椭偏光通过透镜的偏振像差分析[J].应用光学, 1996, 17(2):15-19. http://www.cnki.com.cn/Article/CJFDTotal-YYGX602.004.htm SHEN Xueju. Analysis of polarization aberration of polarized light through lens[J]. Journal of Applied Optics, 1996, 17(2): 15-19. http://www.cnki.com.cn/Article/CJFDTotal-YYGX602.004.htm

[1]	LIU Yanning, ZHANG Guobao. Design and research on pavement crack segmentation based on convolutional neural network[J]. Journal of Applied Optics, 2024, 45(2): 373-384. DOI: 10.5768/JAO202445.0202004
[2]	HOU Jinyao, LIU Weiguo, ZHOU Shun, GAO Aihua, GE Shaobo, XIAO Xiangguo. Image classification of optical element surface defects based on convolutional neural network[J]. Journal of Applied Optics, 2023, 44(3): 677-683. DOI: 10.5768/JAO202344.0305003
[3]	HOU Xiaoming, QIU Yafeng. Weather recognition method based on convolutional neural network and feature fusion[J]. Journal of Applied Optics, 2023, 44(2): 323-329. DOI: 10.5768/JAO202344.0202004
[4]	GUO Meng, DONG Xinming, HAN Guang, WANG Huiquan, WANG Zhongqiang, ZHAO Zhe. Research on accurate detection method of egg embryo activity based on convolutional neural network[J]. Journal of Applied Optics, 2021, 42(2): 268-275. DOI: 10.5768/JAO202142.0202003
[5]	ZHU Simin, ZHAO Haitao. Depth estimation of monocular infrared images based on attention mechanism and graph convolutional neural network[J]. Journal of Applied Optics, 2021, 42(1): 49-56. DOI: 10.5768/JAO202142.0102001
[6]	GU Jing, ZHANG Keshuai, ZHU Yiman. Research on weld defect image classification based on convolutional neural network[J]. Journal of Applied Optics, 2020, 41(3): 531-537. DOI: 10.5768/JAO202041.0302007
[7]	LIU Huaiguang, LIU Anyi, ZHOU Shiyang, LIU Hengyu, YANG Jintang. Research on detection agorithm of solar cell component defects based on deep neural network[J]. Journal of Applied Optics, 2020, 41(2): 327-336. DOI: 10.5768/JAO202041.0202006
[8]	CHEN Qingjiang, SHI Xiaohan, CHAI Yuzhou. Image denoising algorithm based on wavelet transform and convolutional neural network[J]. Journal of Applied Optics, 2020, 41(2): 288-295. DOI: 10.5768/JAO202041.0202001
[9]	CHEN Qingjiang, ZHANG Xue. Image defogging algorithm combined with full convolution neural network[J]. Journal of Applied Optics, 2019, 40(4): 596-602. DOI: 10.5768/JAO201940.0402003
[10]	Wu Xueping, Sun Shaoyuan, Li Jiahao, Li Dawei. Infrared behavior recognition based on spatio-temporal two-stream convolutional neural networks[J]. Journal of Applied Optics, 2018, 39(5): 743-750. DOI: 10.5768/JAO201839.0506002

Cited By

Cited by

Periodical cited type(2)

1.	黄婷，叶南，赵鹏飞. 基于光电跟踪瞄准技术的飞机地面校靶方法研究. 计算机测量与控制. 2025(03): 190-196 .
2.	崔帅华，余磊，朱俊卿，姚天，熊邦书，欧巧凤. 基于透视变换的直升机桨根扭转角测量方法. 应用光学. 2023(02): 412-419 . 本站查看

Other cited types(0)

Get Citation

PDF

XML

Article views (1338) PDF downloads (125) Cited by(2)

Turn off MathJax

Article Contents

Abstract

References

Optimization of polarization aberration for NA1.35 lithographic projection optical system