MI Gao-yuan, ZHU Chang, QI Yun-juan, DOSTANKO A P, GOLOSOV D A, ZAVATSKIY S M. Optical properties of silicon oxide thin films deposited by reactive ion-beam sputtering method[J]. Journal of Applied Optics, 2011, 32(2): 236-240.
Citation: MI Gao-yuan, ZHU Chang, QI Yun-juan, DOSTANKO A P, GOLOSOV D A, ZAVATSKIY S M. Optical properties of silicon oxide thin films deposited by reactive ion-beam sputtering method[J]. Journal of Applied Optics, 2011, 32(2): 236-240.
shu

Optical properties of silicon oxide thin films deposited by reactive ion-beam sputtering method

  • 1.

    Xi-an Technological University,Xi-an 710032,China;

  • 2.

    Belarusian State University of Informatics and Radioelectronics,Minsk 220013,Belarus

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  • Silicon oxide thin films deposited by reactive ion-beam sputtering (RIBS) of Si targets in Ar/O2 producer gas mixture were investigated. The refractive index n, extinction coefficient k, and stoichiometry were dependent on the oxygen concentration in Ar/O2 producer gas mixture and the deposition rate. Silicon oxide films with refractive index of n =1.48 and extinction coefficient of less than 10-5 were deposited with the RIBS method at the wavelength of 0.63 m. An increase in the deposition rate results in the growth of refractive index and extinction coefficient of the film due to incomplete oxidation of silicon and formation of suboxides. In the case of deposition rate more than 0.3 nm/s, even if sputtering is performed in pure oxygen environment, the minimal value of refractive index is more than 1.5. The ana-lysis of the IR transmission spectrum proves that all the deposited films have oxygen deficiency, and the stoichiometry of silicon oxide does not exceed 1.8 based on the investigation of the position of the main absorption peak. The dependence between IR adsorption peak position and refractive index of silicon oxide is established. Thus, depositing silicon-oxide thin films with RIBS without heating the substrates limits the increase of deposition rate.
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  • ［1］NPD Group Company. Flexible display (report)［R］. ［S.l.］: DisplaySearch, an NPD Group Company, 2006: 359.
    ［2］VARASI M, MISIANO C, LASAPONARA L. Deposition of optical thin films by ion-beam sputtering［J］. Thin Solid Films, 1984, 117(3): 163-172.
    ［3］GOLOSOV D A, ZAVATSKIY S M, DOSTANKO A P, et al. Optical properties of a silicon oxide thin films deposited by reactive magnetron sputtering method［C］. ［S.l.］: VI International Conference Plasma Physics and Plasma Technology, 2009(2): 535-538.
    ［4］GOLOSOV D A, ZAVATSKIY S M, DOSTANKO A P. Properties of silicon oxide films deposited by methods of ionbeam and reactive ion-beam sputtering［C］. ［S.l.］: IV International Conference Modern Methods and Technologies Material Formation and Processing, 2009(1): 81-86.
    ［5］朱昌, 米高园, 达斯坦科, 等. 比较2种溅射方法镀制的氧化硅薄膜［J］. 应用光学, 2010, 31(5): 855-859.
    ZHU Chang, MI Gao-yuan, DOSTANKO A P, et al. Comparison of reactive magnetron and reactive ion-beam sputtering methods for deposition of silicon oxide thin films［J］. Journal of Applied Optics, 2010, 31(5): 855-859. (in Chinese with an English abstract)
    ［6］GIUSTINO F, PASQUARELLO A. Infrared spectra at surfaces and interfaces from first principles: evolution of the spectra across the Si(100)-SiO2 interface［J］. Physical Review Letters, 2005, 95(18): 7402-7403.
    ［7］TOMOZEIU N, VAN HAPERT J J, VAN FAASSEN E E, et al. Structural properties of a-SiOx layers deposited by reactive sputtering technique［J］. Optoelectronics and Advanced Materials, 2002, 4(3): 513-521.
    ［8］TOMOZEIU N. SiOx thin films deposited by r.f. magnetron reactive sputtering: structural properties designed by deposition conditions［J］. Optoelectronics and Advanced Materials, 2006, 8(2): 769-775.
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