Preparation of LaTiO3 films and process optimization

In order to obtain the optimum deposition processes of monolayer LaTiO3 films, monolayer LaTiO3 films were prepared by electron-beam thermal evaporation technique. The influence of experiment parameters on laser damage properties of LaTiO3 films was investigated. Experiment results show that the greatest influence on the laser-induced damage threshold (LIDT) of LaTiO3 films process conditions is the deposition temperature, followed by the gas pressure, the last is the electron beam current. The optimum deposition processes of LaTiO3 films are obtained: the deposition temperature is 175 ℃, the gas pressure is 2.010-2 Pa, the electron beam current is 120 mA(8 KeV). It is proved that the LaTiO3 films prepared under the optimum processes conditions has nice laser damage characteristics and the optimum processes conditions possess stability and repeatability. The laser-induced damage threshold of LaTiO3 films is 16.9 J/cm2(1 064 nm，10 ns).