师建涛, 赵兴梅, 郭鸿香. 硒化锌基底上减反射膜的镀制[J]. 应用光学, 2008, 29(supp): 15-17.
引用本文: 师建涛, 赵兴梅, 郭鸿香. 硒化锌基底上减反射膜的镀制[J]. 应用光学, 2008, 29(supp): 15-17.
SHI Jian-tao, ZHAO Xing-mei, GUO Hong-xiang. Fabrication of anti-reflection film on zinc selenide substrate[J]. Journal of Applied Optics, 2008, 29(supp): 15-17.
Citation: SHI Jian-tao, ZHAO Xing-mei, GUO Hong-xiang. Fabrication of anti-reflection film on zinc selenide substrate[J]. Journal of Applied Optics, 2008, 29(supp): 15-17.

硒化锌基底上减反射膜的镀制

Fabrication of anti-reflection film on zinc selenide substrate

  • 摘要: 硒化锌是红外光学系统中常用的材料,由于该材料的透过率比较低,并且比较软,因此需要镀制适当膜层以增加其透过率和机械强度。介绍了一种在硒化锌基底上镀制减反射膜的方法,该方法采用离子源辅助沉积的方法蒸镀硫化锌,并把它作为与硒化锌的结合层;采用共蒸发技术蒸镀2种不同的材料,并把它作为低折射率和保护层材料。最后得到的膜系满足环境稳定标准和强度标准,并且在3μm~5μm波段范围内的平均透过率可以达到98%。

     

    Abstract: Since the crystal ZnSe is soft and low transparent, a thin-film coating must be deposited on its surface to increase its transparence and machine strength. A method of depositing anti-reflection film on the surface of ZnSe substrate is introduced, which adopts ion source to deposit zinc sulfide (ZnS) as a combinative layer of crystal zinc selenide (ZnSe). The two kinds of different fluoride material were evaporated as a low refractive index and protective layer by using the total evaporation technology. A film system which meets the standard of environment and rigidity was prepared. Besides, its average transmissivity attains to 98% at the range of 3μm~5μm.

     

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