弥谦, 赵磊. 一种监控膜厚的新算法[J]. 应用光学, 2014, 35(2): 248-253.
引用本文: 弥谦, 赵磊. 一种监控膜厚的新算法[J]. 应用光学, 2014, 35(2): 248-253.
MI Qian, ZHAO Lei. New algorithm for monitoring optical thin-film thickness[J]. Journal of Applied Optics, 2014, 35(2): 248-253.
Citation: MI Qian, ZHAO Lei. New algorithm for monitoring optical thin-film thickness[J]. Journal of Applied Optics, 2014, 35(2): 248-253.

一种监控膜厚的新算法

New algorithm for monitoring optical thin-film thickness

  • 摘要: 光学薄膜的光学特性与其每一膜层的厚度密切相关,为了制备出符合要求的光学薄膜产品,在制备过程中必须监控膜厚。光学薄膜实时监控精度决定了所镀制的光学薄膜的厚度精度。针对光电极值法极值点附近监控精度低、无法精确监控非规整膜系的缺陷,提出了新的光学薄膜膜厚监控算法。该算法通过数学运算,使得光学薄膜的光学厚度与透射率呈线性关系,并且有效地消除光源波动、传输噪声等共模干扰的影响,算法精度可控制在2%以内。

     

    Abstract: The optical properties of optical thin-film are related to each-layer thickness closely,in order to acquire the optical thin-film product satisfying the requirement,the thickness must be monitored during the course of deposition. The monitoring accuracy of the optical thin-film determines the accuracy of deposited film thickness. Aiming at the defects that the electro-optical extremum method is difficult to monitor the extreme points and the non-normalized coating system accurately, we presented a new algorithm for optical thin-film thickness monitoring.Though the mathematical calculation, the relationship between film thickness and transmittance turns to be linear, and this new algorithm can eliminate the bad effects of optical source fluctuation and transmission noise. The accuracy of this new algorithm is less than 2%.

     

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