VOx films prepared by RF magnetron sputtering

［1］单凡, 黄祥成. 二氧化钒薄膜的光学特性及应用前景［J］. 应用光学, 1996, 17(2): 39-42.
SHAN Fan, HUANG Xiang-cheng. The optical proportion and application perspectives of VO2 film［J］. Journal of Applied Optics, 1996, 17(2): 39-42. (in Chinese with an English abstract)
［2］CAES F C. The effects of biasing and annealing on the optical properties of radio-frequency sputtered VO2［J］. Journal of Vacuum Science, 1990, 8(3): 1391-1395.
［3］尚东, 林理彬, 何捷, 等. 特型二氧化钒薄膜的制备及电阻温度系数的研究［J］. 四川大学学报(自然科学版), 2005, 42(3): 523-527.
SHANG Dong, LIN Li-bin, HE Jie, et al. Preparation and TCR characterization of VO2(B) thin films［J］. Journal of Sichuan University (Natural Science Edition), 2005, 42(3): 523-527. (in Chinese with an English abstract)
［4］MACCHESNEY J B, GUGGENHEIM H J. Growth and electrical properties of vanadium oxide single crystals containing selected impurity ions［J］. Journal of Physics and Chemistry of Solids, 1969, 30(2): 225-234.
［5］周进, 茹国平, 李炳宗, 等. 氧化钒薄膜的制备及其性质的研究［J］. 红外与毫米波学报, 2000, 20(4): 291-295.
ZHOU Jin, RU Guo-ping, LI Bing-zong, et al. Preparation and characterization of thermally sensitive vanadium oxide films［J］. Journal of Infrared and Millimeter Waves, 2000, 20(4): 291-295. (in Chinese with an English abstract)
［6］李志栓, 李静, 吴孙桃, 等. 射频磁控溅射方法制备氧化钒薄膜的研究［J］. 厦门大学学报：自然科学版, 2005, 44(1): 37-40.
LI Zhi-shuan, LI Jing, WU Sun-tao, et al. Studies of vanadium oxide thin films prepared by RF magnetron sputtering methods［J］. Journal of Xiamen University: Natural Science, 2005, 44(1): 37-40. (in Chinese with an English abstract)
［7］王银玲, 李美成, 赵连城. 磁控溅射氧化钒薄膜的相成分及电阻温度特性［J］. 稀有金属材料与工程, 2005, 34(7): 1077-1080.
WANG Yin-ling, LI Mei-cheng, ZHAO Lian-cheng. Phase compositions and resistance-temperature characteristic of VOx thin films by magnetron sputtering［J］. Rare Metal Materials and Engineering, 2005, 34(7): 1077-1080. (in Chinese with an English abstract)
［8］王宏臣, 易新建, 黄光, 等. 一种制备氧化钒薄膜的新工艺［J］. 半导体光电, 2003, 24(4): 280-282.
WANG Hong-chen, YI Xin-jian, HUANG Guang, et al. A new method for preparation of vanadium oxide thin film［J］. Semiconductor Optoelectronic, 2003, 24(4): 280-282. (in Chinese with an English abstract)
［9］刘金城, 鲁建业, 田雪松, 等. 磁控溅射法制备二氧化钒薄膜最佳参量的研究［J］. 光子学报, 2003, 32(1): 65-67.
LIU Jin-cheng, LU Jian-ye, TIAN Xue-song, et al. The study of optimizing parameters in preparing VO2 films by magnetron sputtered method［J］. Acta Photonica Sinica, 2003, 32(1): 65-67. (in Chinese with an English abstract)
［10］SERBINOV I A, BALULANAM S M, NIKLASSION G A, et al. Threshold behavior for the electrical conductivity of V2O5 film reduced by heating in vacuum［J］. Journal of Materials Science, 1988, 23(2): 2076-2078.
［11］WOOD R A. Uncooled thermal imaging with monolithic silicon focal planes［J］. SPIE, 1993, 2020: 322-329.