Progress in Si-microchannel plates

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［19］高延军, 王国政, 端木庆铎, 等. 硅诱导坑形成及深孔列阵电化学微加工工艺方案的探讨［J］. 长春理工大学学报, 2005, 28(1): 43-46.

GAO Yan-jun, WANG Guo-zheng, DUANMU Qing-duo,et al. Formation of silicon pit and study on method of electrochemical micromachining of deep macropore array ［J］. Journal of Changchun University of Science and Technology, 2005, 28(1): 43-46. (in Chinese with an English abstract)

［20］高延军, 端木庆铎, 王国政, 等. 利用电化学刻蚀工艺制备p型硅基大孔深通道阵列［J］. 兵工学报, 2008, 229(12): 1497-1500

GAO Yan-jun, DUANMU Qing-duo, WANG Guo-zheng, et al. Formation of p-type silicon-base macropore channel array by utilizing electrochemical etching technology ［J］. Acta Armamentarii, 2008, 229(12): 1497-1500. (in Chinese with an English abstract)

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［23］WANG G Z, FU S C, CHEN L, et al. Influence of voltage on photo-electrochemical etching of n-type macroporous silicon arrays ［J］. Journal of Semiconductors, 2010, 31(1): 116002-1.

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WANG Guo-zheng, XIONG Zheng, WANG Ji, et al. Control technology of channel dimension in the photo-electro-chemical etching for silicon microchannel arrays ［J］. Journal of Changchun University of Science and Technology, 2010, 33(3): 59-62 .(in Chinese with an English abstract)

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［27］SIEGMUND O H W, TREMSIN A S, VALLERGA J V, et al. Silicon microchannel plates: initial results for photon counting detectors ［J］. SPIE, 2001, 4140: 188-198.

［28］TREMSIN A S, VALLERGA J V, SIEGMUND O H W, et al. The latest developments of high gain Si microchannel plates［J］. SPIE, 2003, 4854: 215-224.

［29］SIEGMUND O H W, TREMSIN A S, VALLERGA J V, et al. Process on the development of silicon microchannel plates［J］. SPIE, 2002, 4497: 139-148.

［30］SMITH A W, BEETZ C P, BOERSTLER R W, et al. Si microchannel plates for image intensification［J］. SPIE, 2000, 4128: 14-22.