Multi-beam maskless lithograph system

A multi-beam lithograph system is introduced. The system uses a digital micro-mirror device (DMD) as a spatial light modulator to modulate the 405nm laser. By controlling the zone-plate-array or focusing-element-array to focus on the substrate to form a focusing-lattice, scanning lithograph is achieved with a nanometer moving platform. The setup and principle of the system is introduced and the result of the experiments is given. The experiment proved that multi-beam lithography with resolution of 400nm is achieved using the ordinary blue light and focusing-element-array.