Influence of Broad Beam Cold Cathode and End Hall Ion Sources on Transmissivity and Stress
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Abstract
Under the conditions of ion beamassisted deposition (IBAD) using broad beam cold cathode and end Hall ion sources, utilizing the box type of Nanguang ZZS7001/G coater,the influences of two IBADs on transmissivity and stress have been demonstrated respectively.With the analyses of a great deal of experimental datas, the properties of the optical thinfilm got by IBAD with low energy and high current are better than that got by high energy IBAD. The reasons of the property variation of flim layers is analyzed and the processing parameters are given in this paper. The experiments show that IBAD with low energy and high current makes the layer properties much better.
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