YANG Zhao-jin, WANG Fang, LI Qi. Ultraviolet metrology technology in moonexploration project[J]. Journal of Applied Optics, 2006, 27(supp): 10-13.
Citation: YANG Zhao-jin, WANG Fang, LI Qi. Ultraviolet metrology technology in moonexploration project[J]. Journal of Applied Optics, 2006, 27(supp): 10-13.

Ultraviolet metrology technology in moonexploration project

  • Moonexploration project is one of the main projects during the periods “tenth fiveyearprogram” and “eleventh fiveyearprogram” in china. Optical technology and optical metrology technology have played an important role in the moonexploration project. Ultraviolet technology and ultraviolet metrology are attached more and more importance in national defense industry system and the moonexploration project. The role played by optical technology and optical metrology in the moonexploration, and the work done by Optical Metrology Laboratory of XI′AN Institute of Applied Optics are deseribed in this paper. The content of ultraviolet metrology is defined. The work in ultraviolet metrology that has been done and will be done are presented.
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