0.4μm~1.1μm AR film prepared with TiO2, SiO2 and MgF2
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Abstract
The coating techniques for preparing 0.4μm~1.1μm wide spectral AR film made up of TiO2, SiO2 and MgF2 are discussed. Some factors such as the spectral transmittance range, refractive index, vaporous mode, mechanical properties, chemical stability and anti radiation were considered in the selection of filmmaterials. TiO2, SiO2 and MgF2 film-materials were adopted for the preparation of AR film operating at wide spectrum of 0.4μm~1.1μm according to the experience of multilayer design, the understanding of film-material performance and the performance of the domestic equipments. The film structure is GHMHMHMHLA. This technique is convenient and robust. The film has good spectral and mechanical performance, and it meets the operational requirement of electro-optical system.
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