微纳高深宽比结构暗弱干涉图像的自适应增强

    Adaptive enhancement of micro-nano high aspect ratio structural weak interference images

    • 摘要: 宽谱干涉测量技术是一种适用性广泛的精密测量方法,可用于半导体器件中小线径微纳高深宽比结构的测量。然而,随着微纳结构线径尺寸的进一步缩小及深度参数的不断增加,干涉测量信号的对比度显著下降,噪声干扰亦日趋严重。针对该问题,提出一种双阶段小波分解增强算法。该算法采用自适应全局增强与贝叶斯局部去噪相结合的两级处理框架:首先,在db5小波基函数上,利用信息熵动态选取全局阈值,初步实现条纹对比度提升;随后,在db8小波基函数上,结合邻域能量分析与贝叶斯阈值进行局部精细化去噪。实验结果表明:采用本算法后,高深宽比结构深度测量的误差率均低于0.2%;与传统离散小波变换、贝叶斯去噪及对比度受限自适应直方图均衡化方法相比,误差率至少降低12.3%。该算法有效解决了微纳高深宽比结构暗弱干涉图像信息的高精度提取问题,为小线径微纳高深宽比结构的高精度无损检测提供了一种可靠的技术方案。

       

      Abstract: Wide-spectrum interferometry is a highly applicable and precise measurement method, which can be used to measure the small-diameter micro-nano high aspect ratio structure of semiconductor devices. However, with the reduction of the diameter size of micro-nano structures and the deepening of depth parameters, the contrast of interferometric measurement signals has significantly decreased, and noise interference has become increasingly severe. To address this issue, a two-stage wavelet decomposition enhancement algorithm was proposed in this paper. The algorithm employed a two-level processing framework that combined adaptive global enhancement with Bayesian local denoising. First, based on the db5 wavelet basis, a global threshold was dynamically determined using information entropy to preliminarily improve the fringe contrast. Subsequently, on the db8 wavelet basis, local refined denoising was performed by integrating neighborhood energy analysis with the Bayesian threshold. Experimental results indicate that the error rates of depth measurement for high-aspect-ratio structures are all below 0.2% when the proposed algorithm is applied. Compared with conventional discrete wavelet transform, Bayesian denoising, and contrast-limited adaptive histogram equalization methods, the error rate is reduced by at least 12.3%. The algorithm is shown to effectively resolve the challenge of high-precision extraction of weak interferometric image information from micro-nano high-aspect-ratio structures, providing a reliable technical solution for high-precision non-destructive measurement of small-linewidth micro-nano structures with high aspect ratios.

       

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