光学元件高反射比、高透射比测试技术研究

范纪红, 侯西旗, 袁良, 杨斌, 秦艳, 宋金鸿

范纪红, 侯西旗, 袁良, 杨斌, 秦艳, 宋金鸿. 光学元件高反射比、高透射比测试技术研究[J]. 应用光学, 2011, 32(6): 1184-1188.
引用本文: 范纪红, 侯西旗, 袁良, 杨斌, 秦艳, 宋金鸿. 光学元件高反射比、高透射比测试技术研究[J]. 应用光学, 2011, 32(6): 1184-1188.
FAN Ji-hong, HOU Xi-qi, YUAN Liang, YANG Bin, QIN Yan, SONG Jin-hong. High reflectance and high transmittance measurement for optical elements[J]. Journal of Applied Optics, 2011, 32(6): 1184-1188.
Citation: FAN Ji-hong, HOU Xi-qi, YUAN Liang, YANG Bin, QIN Yan, SONG Jin-hong. High reflectance and high transmittance measurement for optical elements[J]. Journal of Applied Optics, 2011, 32(6): 1184-1188.

光学元件高反射比、高透射比测试技术研究

详细信息
    通讯作者:

    范纪红(1977-),女,宁夏银川人,博士研究生,主要从事光学计量方面的研究工作。

  • 中图分类号: O433.5; TN247

High reflectance and high transmittance measurement for optical elements

  • 摘要: 为了实现光学元件、光学薄膜等高反射比、高透射比的测量,以单次反射测量法为基础,并结合激光稳功率技术、双光路测量技术以及精密探测技术,建立了一套精密测试系统,实现对光学元件632.8 nm和1 064 nm两个波长下高反射比与高透射比的测量。实验和测量不确定度分析验证测试系统在632.8 nm波长下高反射比与高透射比的测量不确定度优于0.008%,在1 064 nm波长下高反射比与高透射比的测量不确定度优于0.015%。
    Abstract: In order to measure high reflectance and high transmittance of optic components and coat films, a precise measurement facility was set up which was based on single reflection measurement using laser power-stabilized technique, double optical path measurement technique and precise detection technique. High reflectance and high transmittance were measured at 632.8 nm and 1 064 nm wavelengths on the facility. Experiment result and uncertainty analysis showed that the measurement uncertainty of high reflectance and high transmittance was less than 0.008% at 632.8 nm and was less than 0.015% at 1 064 nm.
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出版历程
  • 刊出日期:  2011-11-14

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