ALD氧化铝单层膜1 064 nm激光损伤特性研究

刘志超; 卫耀伟; 陈松林; 马平

ALD氧化铝单层膜1 064 nm激光损伤特性研究

成都精密光学工程研究中心,四川成都610041

详细信息

通讯作者:
刘志超（1984-），男，满族，湖北荆州人，硕士研究生，主要从事光学材料的强激光辐照损伤研究工作。

中图分类号: TN249; O437
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- 刊出日期: 2011-03-14

Characterization of 1 064 nm laser induced damagein ALD optical film

Fine Optical Engineering Research Center,Chengdu610041,China

摘要

摘要: 采用原子层沉积技术(atomic layer deposition，ALD)在熔石英和BK7玻璃基底上镀制Al2O3单层膜。利用小口径损伤在线测试平台对膜层的1 064 nm激光损伤特性进行了实验测量，获得膜层损伤阈值约为10.3 J/cm2，对比了其与BK7基底损伤阈值之间的差异；利用Nomarski显微镜和原子力显微镜分析讨论了损伤形态的特点，结果表明损伤主要表现为膜层脱落和基片小孔烧蚀，其中小孔深度集中在70 nm～95 nm范围；讨论了损伤发生的诱因，得出膜基界面可能存在吸收源先驱的推断。
- 激光损伤 /
- 原子层沉积 /
- 损伤阈值 /
- 损伤形态
Abstract: Based on Atomic Layer Deposition (ALD) technology, the single layer films were coated on fused silica and BK7 glass substrate respectively. Using small optical damage test facility, the 1064 nm laser induced damage threshold between ALD films and BK7 substrate was compared. The result shows that the ALD film damage threshold is about 10.3 J/cm2. With the use of Nomarski microscope and Atomic Force Microscope, the morphology of damage site was discussed. The result shows that there are two kinds of damage, the peeling damage on the films and the small pits damage on substrate. The pits damage related to melting and vaporization has the depth between 70 nm and 95 nm. The damage precursors may exist in the boundary surface of ALD films and substrate.
- laser induced damage /
- Atomic Layer Deposition /
- damage threshold /
- damage morphology

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参考文献(1)

［1］SNEH O, PHELPS R. Thin film atomic layer deposition equipment for semiconductor processing ［J］. Thin Solid films, 2004, 402:248-252.
［2］CARCIA P F, MCLEAN R S, REILLY M H, et al. Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers ［J］. Appl. Phys. Lett., 2006, 89: 031915.
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ALD氧化铝单层膜1 064 nm激光损伤特性研究

通讯作者:
刘志超（1984-），男，满族，湖北荆州人，硕士研究生，主要从事光学材料的强激光辐照损伤研究工作。

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Characterization of 1 064 nm laser induced damagein ALD optical film

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ALD氧化铝单层膜1 064 nm激光损伤特性研究

通讯作者: 刘志超（1984-），男，满族，湖北荆州人，硕士研究生，主要从事光学材料的强激光辐照损伤研究工作。

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出版历程

Characterization of 1 064 nm laser induced damagein ALD optical film

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出版历程

目录

相关数据库

广告合作

友情链接

帮助中心

通讯作者:
刘志超（1984-），男，满族，湖北荆州人，硕士研究生，主要从事光学材料的强激光辐照损伤研究工作。