Abstract: The maskless laser lithography system using digital micromirror device (DMD) based on digital light processing (DLP) structure was used widely, but the lithography image quality and lithography speed should be improved. A new method for solving these problems is proposed, which adopts FPGA to control DMD. The new structure enables the flexible control of micromirror lock and improves the system lithography image quality accordingly. The synchronization signal and high frame rate of the new structure improve system lithography speed.