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多层高反膜光学常数和厚度的反演

周天宇 杨开勇 吴素勇

周天宇, 杨开勇, 吴素勇. 多层高反膜光学常数和厚度的反演[J]. 应用光学, 2011, 32(1): 128-132.
引用本文: 周天宇, 杨开勇, 吴素勇. 多层高反膜光学常数和厚度的反演[J]. 应用光学, 2011, 32(1): 128-132.
ZHOU Tian-yu, YANG Kai-yong, WU Su-yong. ADetermination of optical constants and thicknesses of high-reflection multilayer system[J]. Journal of Applied Optics, 2011, 32(1): 128-132.
Citation: ZHOU Tian-yu, YANG Kai-yong, WU Su-yong. ADetermination of optical constants and thicknesses of high-reflection multilayer system[J]. Journal of Applied Optics, 2011, 32(1): 128-132.

多层高反膜光学常数和厚度的反演

详细信息
    通讯作者:

    周天宇(1985-),男,四川巴中人,硕士研究生,主要从事光学薄膜方面的研究工作。

  • 中图分类号: O484.4

ADetermination of optical constants and thicknesses of high-reflection multilayer system

  • 摘要: 基于精英保留策略的遗传算法具有良好的全局寻优能力和很强的鲁棒性,基于Levenberg-Marquardt算法的非线性最小二乘法具有快速、高效的局部收敛能力。研究了将这两种算法结合起来求解多层膜光学常数和厚度的可行性和有效性。结果表明:基于两种算法的组合反演算法综合了这两种算法的优点,能以较大的概率、较高的精度找到在实际约束条件下多层膜的光学常数和厚度,特别是在寻找全局最优解方面表现出色。根据全光谱透射拟合法基本原理,应用组合反演算法分别在考虑测量误差与不考虑测量误差两种情况下反演15层规整高反膜的光学常数和厚度,得到了较为精确的薄膜参数。模拟实验表明:此组合反演算法可有效地求解多层膜反演问题,在反演多层膜光学常数和厚度方面具有实际的应用价值。
  • [1]TIKHONOV A N, TIKHONRAVOV A V, TRUB-ETSKOV M K. Second order optimization methods in the synthesis of multilayer coatings[J]. Journal of Mathematical Physics, 1993,33(10):1339-1352.[2]TIKHONRAVOV A V,TRUBETSKOV M K,TIK-HONRAVOV A A, et al. Effects of interface roughness on the spectral properties of thin films and multilayer[J]. Applied Optics,2003,42(25):5140-5148.[3]王胭脂,张伟丽,范正修,等.SiO2薄膜折射率的准确拟合分析[J].中国激光,2008,35(5):760-763.WANG Yan-zhi, ZHANG Wei-li, FAN Zheng-xiu, et al. Analysis for accurately fitting the refractive index of SiO2 thin film[J]. Chinese Journal of Lasers, 2008,35(5):760-763. (in Chinese with an English abstract)[4]沈伟东,刘旭,叶辉,等.确定薄膜厚度和光学常数的一种新方法[J].光学学报,2004,24(7):885-889.SHEN Wei-dong, LIU Xu, YE Hui, et al. A new method for determination of the optical constants and thickness of thin film[J]. Acta Optica Sinica, 2004,24(7):885-889. (in Chinese with an English abstract)[5]顾培夫,陈海星,郑臻荣,等.弱吸收多层薄膜消光系数的反演[J].物理学报,2005,54(8):3722-3725.GU Pei-fu, CHEN Hai-xing, ZHENG Zhen-rong, et al. Determination of the extinction coefficient of a weakly absorbing multilayer system[J]. Acta Physica Sinica,2005,54(8):3722-3725. (in Chinese with an English abstract)[6]楚栋,宫兴致,程梁,等.基于遗传退火算法的多层薄膜厚度测量[J].光电工程,2010,37(2):45-49.CHU Dong, GONG Xing-zhi, CHENG Liang, et al. Multilayer film thickness measurement based on genetic simulated annealing algorithm[J]. Opto-Electronic Engineering, 2010,37(2):45-49. (in Chinese with an English abstract)[7]吴素勇.遗传算法在膜系设计中的应用[D].长沙:国防科技大学,2007:16-21.WU Su-yong. Design thin films by genetic algorithm[D]. Changsha: National University of Defence Technology, 2007:16-21. (in Chinese)[8]唐晋发,顾培夫,刘旭,等.现代光学薄膜技术[M].杭州:浙江大学出版社,2006.TANG Jin-fa, GU Peifu, LIU Xu, et al. Modern optical thin film technology[M]. Hangzhou: Zhejiang University Press, 2006. (in Chinese)[9]VERLY P G,TIKHONRAVOV A V,TRUBETSKOV M K.Efficient refinement algorithm for the synthesis of inhomogeneous optical coatings[J]. Applied Optics, 1997,36(7):1487-1495.[10]雷英杰,张善文,李续武,等.MATLAB遗传算法工具箱及应用[M].西安:西安电子科技大学出版社,2005.LEI Ying-jie, ZHANG Shan-wen, LI Xu-wu, et al. Introduce and apply the genetic algorithm search toolbox[M]. Xi’an: Xidian University Press, 2005. (in Chinese)[11]陈宝林.最优化理论与算法[M].北京:清华大学出版社,2005.CHEN Bao-lin. Optimization theory and algorithm[M]. Beijing: Tsinghua University Press, 2005. (in Chinese)[12]TIKHONRAVOV A V, TRUBETSKOV M K, KOKAREV M A, et al. Effects of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films[J]. Applied Optics,2002,41(13):2555-2560.[13]吴素勇,龙兴武,黄云,等.减小由光谱测量数据误差造成的薄膜光学参数反演不确定度的方法[J].中国激光, 2009,36(8):2171-2176.WU Su-yong,LONG Xing-wu,HUANG Yun,et al. Methods for decreasing optical parameters reverse determination uncertainty of thin films caused by spectral measurement errors[J]. Chinese Journal of Lasers, 2009,36(8):2171-2176. (in Chinese with an English abstract)
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  • 刊出日期:  2011-01-15

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