Abstract: The residual stress is an important factor for optic thin film quality，and it has an adverse effect on the optical components. Based on the principle of elasticity and strain misfit, a new calculation method of theoretical model to predict the residual stress distribution on optical thin films is put forward in this paper. The calculated result was compared with the result obtained by an interferometer. The variation of the residual stress of the substrate with parameters of optical thin films was analyzed with the model we set up. The results indicate the model is rational, the total residual stress of the substrate increases when coating temperature rises， intrinsic stress changes little, and the stress of upper and lower surfaces of substrate increases but the stress of thin film decreases when the thickness of the substance is reduced．The central axis of substrate is approximately located at the position of 2／3 below the upper surface of substrate.