连续型平面衍射聚光透镜掩模的制作

王多书; 罗崇泰; 刘宏开; 马勉军; 黄良甫

连续型平面衍射聚光透镜掩模的制作

兰州物理研究所,甘肃兰州730000

详细信息

通讯作者:
王多书

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出版历程
- 刊出日期: 2005-11-09

Fabrication of continuous relief mask for diffractive plane focus lens

Lanzhou Institute of Physics,Lanzhou 730000,China

More Information

Corresponding author:
WANG Duo-shu

摘要

摘要: 针对目前二元光学元件掩模制作工艺过程的诸多不足，对连续型平面衍射聚光透镜掩模的激光直写制作工艺进行了研究。基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。采用激光直写技术，利用CLWS300M／C极坐标激光直写设备、S1830光刻胶和MICROPOSIT351显影液，进行了刻写实验。实验表明，激光能量、预烘烤温度、显影液浓度以及预曝光对掩模微结构的制作均有影响。最后制作了掩模。与二元光学元件掩模的制作工艺相比，该技术具有工艺简单、制作周期短且易于操作的优点。
- 掩模 /
- 聚光透镜 /
- 平面衍射 /
- 激光直写技术
Abstract: The fabrication technology of continuous relief mask for diffractive plane focus lens is studied in the paper. According to Kirchhoff’s scalar diffraction theory, with the ray tracing method, a continuous relief mask for diffractive focus lens has been designed. Using the technology, some experiments on the writing of the mask were carried out with the help of CLWS300M/C. The results show that the laser energy, prebake temperature, developer concentration and preexposure will affect the microstructure of the mask.The mask was fabricated with such technology after a lot of efforts. Compared with the technology for binary optical mask, the technology has the following strong points: process simplification, short period of fabrication and easy operation.
- mask /
- focusing lens /
- plane diffraction /
- laser direct writing