Abstract: The fabrication technology of continuous relief mask for diffractive plane focus lens is studied in the paper. According to Kirchhoff’s scalar diffraction theory, with the ray tracing method, a continuous relief mask for diffractive focus lens has been designed. Using the technology, some experiments on the writing of the mask were carried out with the help of CLWS300M/C. The results show that the laser energy, prebake temperature, developer concentration and preexposure will affect the microstructure of the mask.The mask was fabricated with such technology after a lot of efforts. Compared with the technology for binary optical mask, the technology has the following strong points: process simplification, short period of fabrication and easy operation.