激光微细熔覆快速原型制造的厚膜电容组织性能

Structure and properties of thickfilm capacitors fabricated by laser microcladding rapid prototype

  • 摘要: 针对传统工艺制备的厚膜电容尺寸有限、容量低、损耗大,仅限于一些特定的应用领域,提出采用激光微细熔覆快速原型制造技术在陶瓷基板上制备电容,它具有速度快,不需要掩膜等特点。着重分析电容器的组织性能以及电容、介电常数、品质因数和绝缘电阻等电器性能,并对电容器的形成机理进行了研究。实验证明,激光微细熔覆快速原型制造技术比传统烧结工艺制备的厚膜电容容量大、再现性好,其组织致密、均匀,不存在界面成分的扩散。

     

    Abstract: To overcome the shortcomings of thickfilm capacitors (limited size, low capacity and high dissipation) fabricated by traditional thickfilm technology, which limit their applications to some specific areas, a technology fabricating the thickfilm capacitors on ceramic substrate by laser microcladding rapid prototype is put forward. The novel technology does not take the mask as a necessity as in the former capacitor. The structure and properties of the capacitor fabricated by laser microcladding and the traditional sintering method, which includes capacity, dielectric crystal, quality factor and insulation resistance, are analyzed. The forming mechanism of the capacitor is studied. The results prove that, compared with those made with traditional sintering techniques, the capacitors fabricated by laser microcladding rapid prototype method have better repeatability and higher capacity, it is more compact and also minimizes the composition diffuseness between interfaces.

     

/

返回文章
返回