聚焦慢速高荷态重离子束微束斑X射线源
X-ray Source with Micro-beam Produced with Slow Highly Charged Ions
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摘要: 利用电子束离子源(EBIS)或者电子束离子陷阱(EBIT)产生的慢速高电荷态重离子束轰击金属靶面,离子束与靶面作用并复合辐射特征X射线;并将高荷态离子束采用离子光学系统会聚为微细束后再与靶面作用,能够辐射出微米甚至亚微米级、纳米级的微束斑X射线.本文介绍这一新型微束斑X射线源的结构、机理及其特性等.Abstract: The electron beam ion trap(EBIT) and the electron ion source(EBIS) are new instruments for the study of X-ray produced by very highly-charged ions when they interact with free electrons. Some of the design and physics features of EBIT/EBIS are described, and the characters of the X-ray produced with them are described too. Micro-focal X-ray can be taken out if focusing the ion beam with the ion-optical system.