直流磁控溅射Cr-Cr<SUB>2</SUB>O<SUB>3</SUB>复合金属陶瓷薄膜光学特性研究

直流磁控溅射Cr-Cr₂O₃复合金属陶瓷薄膜光学特性研究

详细信息

School of Opto-electronic Engineering,Xi′an Technological University,Xi′an 710032,China

摘要: 采用直流反应磁控溅射技术在不同靶电流条件下制备了Cr-Cr2O3金属陶瓷薄膜，并利用椭偏仪测量了薄膜的光学常数。采用修正的 M-G (Maxwell-Gannett)理论对不同靶电流条件下沉积的Cr-Cr2O3金属陶瓷薄膜的光学常数进行了理论计算，并将理论计算结果与实验数据进行了比较。结果表明：随着靶电流的增加，膜层中金属微粒体积百分比增加，金属微粒的平均半径随之增加，且金属微粒逐渐趋于扁圆形，理论计算结果与实验结果吻合较好。
- 直流磁控溅射 /
- 金属陶瓷薄膜 /
- 光学常数 /
- 修正M-G理论
Abstract: Cr-Cr2O3 cermet films were deposited by DC reactive magnetron sputtering under different target currents. The optical constants of the films were measured by a spectroscopic ellipsometer in VISNIR. The optical constants of Cr-Cr2O3 cermet films were theoretically calculated with the modified M-G (Maxwell-Gannett) theory, and the calculated results were compared with the experimental data. The results indicate that with the increase of target current, the metal volume fraction and the radius of the metal particles of Cr-Cr2O3 cermet films increases, and the metal particles become oblate spheroids. The results obtained by the modified M-G theory agree with the experimental results.
- DC magnetron sputtering /
- cermet film /
- optical constant /
- modified M-G theory