硒化锌基底上减反射膜的镀制

详细信息

Fabrication of anti-reflection film on zinc selenide substrate

摘要: 硒化锌是红外光学系统中常用的材料，由于该材料的透过率比较低，并且比较软，因此需要镀制适当膜层以增加其透过率和机械强度。介绍了一种在硒化锌基底上镀制减反射膜的方法，该方法采用离子源辅助沉积的方法蒸镀硫化锌，并把它作为与硒化锌的结合层；采用共蒸发技术蒸镀2种不同的材料，并把它作为低折射率和保护层材料。最后得到的膜系满足环境稳定标准和强度标准，并且在3μm～5μm波段范围内的平均透过率可以达到98%。
- 红外光学系统 /
- 减反射膜 /
- 离子源辅助沉积 /
- 共蒸发技术
Abstract: Since the crystal ZnSe is soft and low transparent, a thin-film coating must be deposited on its surface to increase its transparence and machine strength. A method of depositing anti-reflection film on the surface of ZnSe substrate is introduced, which adopts ion source to deposit zinc sulfide (ZnS) as a combinative layer of crystal zinc selenide (ZnSe). The two kinds of different fluoride material were evaporated as a low refractive index and protective layer by using the total evaporation technology. A film system which meets the standard of environment and rigidity was prepared. Besides, its average transmissivity attains to 98% at the range of 3μm～5μm.
- infrared optical system /
- anti-reflection film /
- ion source auxiliary deposition /
- total evaporating technology