Abstract: In order to explain atom photolithography’s role in nanometrology and standard transfer, nanometrology and its status are briefly introduced, the principle of atom photolithography and its features in nanometrology are presented. The mechanism for atom photolithography was analyzed with an experimental setup of Cr atom photolithography. The experimental results indicate that nanometer level stripe could be obtained to provide more precise means for nanometrology and standard transfer. Finally, two kinds of atom photolithography technology, depositatom and dummyslit atom photolithography are elaborated, and their differences are pointed out. The technology mentioned in this paper can be used as a reference for atom photolithography under different conditions.