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高温状态下的材料法向光谱发射率测量

袁良 袁林光 董再天 李燕 范纪红 卢飞 赵俊成 张灯 尤越

袁良, 袁林光, 董再天, 李燕, 范纪红, 卢飞, 赵俊成, 张灯, 尤越. 高温状态下的材料法向光谱发射率测量[J]. 应用光学.
引用本文: 袁良, 袁林光, 董再天, 李燕, 范纪红, 卢飞, 赵俊成, 张灯, 尤越. 高温状态下的材料法向光谱发射率测量[J]. 应用光学.
YUAN Liang, YUAN Linguang, DONG Zaitian, LI Yan, FAN Jihong, LU Fei, ZHAO Juncheng, ZHANG Deng, YOU Yue. Measurement of normal spectral emissivity of materials at high temperature[J]. Journal of Applied Optics.
Citation: YUAN Liang, YUAN Linguang, DONG Zaitian, LI Yan, FAN Jihong, LU Fei, ZHAO Juncheng, ZHANG Deng, YOU Yue. Measurement of normal spectral emissivity of materials at high temperature[J]. Journal of Applied Optics.

高温状态下的材料法向光谱发射率测量

详细信息
  • 中图分类号: TN206

Measurement of normal spectral emissivity of materials at high temperature

  • 摘要: 为满足隐身材料、热防材料和隔热涂层等高温材料涂层的光谱发射率的高精度测量需求,研究了在1 273 K~3 100 K条件下准确测量材料法向光谱发射率的方法。基于发射率定义,建立了材料法向光谱发射率测量模型,并在该基础上研建了光谱范围为0.7 μm~12 μm的材料法向光谱发射率测量装置。为克服测量装置中样品高精度加热时伴随腔体效应的技术难点,研制了具备可移动石墨坩埚的样品加热炉,取得了良好的实验效果。使用发射率测量装置对SiC与低发射率涂层2种样品的法向光谱发射率进行实验测量。结果表明:2种样品的法向光谱发射率均随波长增加而降低,随温度的升高而升高。最后对高温状态下材料法向光谱发射率测量不确定度进行了评定,相对扩展不确定度为3.6%。
  • 图  1  高温状态下材料法向发射率测量装置组成图

    Fig.  1  The composition diagram of measurement facility of normal emissivity of materials at high temperature

    图  2  高温状态下材料法向发射率测量装置实物图

    Fig.  2  Actual picture for measurement facility of normal emissivity of materials at high temperatu

    图  3  样品加热炉组成图

    Fig.  3  The composition diagram of temperature sample furnace

    图  4  SiC样品法向光谱发射率测量结果

    Fig.  4  Result of normal spectral emissivity of SiC

    图  5  低发射率涂层法向光谱发射率测量结果

    Fig.  5  Result of normal spectral emissivity of low emissivity coating

    表  1  法向光谱发射率测量不确定度分析

    Table  1  Measurement uncertainty analysis of normal spectral emissivity

    不确定度分量标准不确定度/%
    高温黑体发射率0.05
    高温黑体温度测量0.6
    样品材料温度测量0.6
    红外探测系统测量1.1
    光谱分光系统波长测量0.5
    测量重复性1.0
    相对合成标准不确定度1.8
    相对扩展不确定度(k=2)3.6
    下载: 导出CSV
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  • 网络出版日期:  2022-07-26

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