光电成像检测系统像面照度均匀性分析

赵霞; 刘宾

光电成像检测系统像面照度均匀性分析

赵霞^,,
刘宾

1.
中北大学电子测试技术国家重点实验室,山西太原 030051

详细信息

通讯作者:
赵霞 (1981-)，女，山西太原人，讲师，主要从事光电检测、信息处理方面的研究。 Email:zhaoxianuc@126.com

中图分类号: TP394.1；TH691.9
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出版历程
- 刊出日期: 2014-03-15

Illuminance uniformity of image plane in photoelectronic imagetesting system

ZHAO Xia^,,
LIU Bin

1.
National Key Laboratory for Electronic Measurement Technology,North University of China,Taiyuan 030051,China

摘要

摘要: 非均匀发光光源、大视场角等因素会造成光学成像检测系统像面照度分布不均匀,进而导致检测效率下降。研究非均匀发光光源和大视场角对像面照度均匀性的影响程度,首先建立光源间距与受光面接收照度间的关系模型，仿真分析不同LED间距对像面照度均匀性的影响,然后建立光学耦合系统的物面张角和像面照度间的关系模型，仿真分析物面张角对像面照度均匀性的影响。实验结果表明：在非均匀发光光源和大视场角的作用下，检测系统会造成像面照度严重不均匀现象。研究结果为后续像面照度校正算法设计提供了理论依据。
- 光学成像 /
- 检测 /
- 像面光照度 /
- 均匀性
Abstract: Non-uniform light source and wide field angle were two causes for illumination non-uniformity of image plane in photoelectronic image testing system. To study the influence, the relationship model between spacing of LED light source and image plane illumination was built. The influence of different LED intervals on image plane illumination was simulated and analyzed. The relationship model between opening angle of object plane of optical coupling system and image plane illumination was established, and the influence of opening angle of object plane on illuminance uniformity of image plane was simulated and studied. The experiment results show that non-uniform light source and wide field angle are two main causes for non-uniformity illumination of image plane, which provides the theoretical basis for designing better corresponding correction algorithm.
- optical imaging /
- detection /
- illumination intensity at image plane /
- uniformity

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参考文献(1)

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