光学材料光学不均匀性绝对测量误差分析

Error analysis of absolute test method of inhomogeneity of optical materials

  • 摘要: 绝对测量技术去除了干涉仪参考面面形误差,可实现光学材料光学不均匀性的高精度测量。对现有主要光学材料光学不均匀性绝对检测技术进行了总结比较,针对像素错位、干涉图分辨率、干涉仪测量重复性、样品厚度以及折射率测量等因素对光学不均匀性绝对检测的影响进行了实验分析。实验结果表明:干涉仪重复性是光学不均匀性测量的主要误差。样品翻转测量法、样品直接透射测量法、平行平板样品测量法3种测量方法均可实现光学不均匀性(RMS)10-8检测精度。

     

    Abstract: Absolute test eliminates the surface errors of reference plane of interferometer, so that the inhomogeneity of optical materials can be measured with high accuracy. A brief review and comparison of several mainstream absolute test methods for inhomogeneity of optical material were given. And influence of the factors, such as the pixel offset, resolution of interference pattern, repetition of interferometer, the sample thickness and the refractive index measurement, etc, on the measurement error of absolute test was analyzed respectively. Experimental results indicate that the measuring accuracy of window-flipping method, transmission method and parallel flat method can reach 10-8 respectively. Repetition of interferometer is the main error in absolute test method of the inhomogeneity of optical materials.

     

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