紫外光辐照对TiO2薄膜光学性能的影响

潘永强; 白涛; 田玉珺

紫外光辐照对TiO2薄膜光学性能的影响

1.
西安工业大学光电工程学院,陕西西安 710032

详细信息

通讯作者:
潘永强（1974-），男，陕西西安人，副教授，硕士生导师，主要从事光学薄膜工艺和光学检测方面的研究工作。 Email: pyq_867@163.com

中图分类号: TN205; O484.1
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出版历程
- 刊出日期: 2013-01-15

Influence of UV irradiation on optical property of TiO2 thin film

1.
School of Photoelectric Engineering,Xi-an Technological University,Xi-an 710032,China

摘要

摘要: 采用电子束热蒸发技术在不同工艺下制备了TiO2薄膜，利用椭偏仪和分光光度计研究了紫外光辐照后薄膜光学特性的变化。实验结果表明：不同工艺下制备的TiO2薄膜经相同条件的紫外光辐照后，其折射率均有所下降，折射率的变化量随着沉积速率上升、基底温度上升、工作真空度下降分别有增大的趋势。薄膜的透射率在紫外光辐照后有一定下降。相同工艺条件下制备的TiO2薄膜，其折射率随着辐照时间的增加，先迅速降低，随后又有所增加，但均低于辐照前薄膜的折射率。
- 薄膜 /
- 光学特性 /
- 电子束热蒸发 /
- 紫外光辐照
Abstract: The TiO2 thin films were prepared by electron beam evaporation with different craft parameters, and the optical property of thin film with ultraviolet (UV) irradiation were studied by using ellipsometer and spectrophotometer. The results show that the refractive index of TiO2 thin film decreases with different craft parameters after the same UV irradiation, and moreover, the variation of the index increases with the raise of the deposition rate and the substrate temperature, as well as the decline of working pressure. The transmittance of thin film declines after radiation. With the same craft parameter, the refractive index declines rapidly first and then increases along with the radiation time, however, it is always less than the initial refractive index.
- thin film /
- optical property /
- electron beam evaporation /
- ultraviolet radiation

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参考文献(1)

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