大曲率球面零件光学膜厚分布数值计算

刘青龙, 杨崇民, 张建付, 米高园, 韩俊, 金柯

刘青龙, 杨崇民, 张建付, 米高园, 韩俊, 金柯. 大曲率球面零件光学膜厚分布数值计算[J]. 应用光学, 2012, 33(6): 1128-1132.
引用本文: 刘青龙, 杨崇民, 张建付, 米高园, 韩俊, 金柯. 大曲率球面零件光学膜厚分布数值计算[J]. 应用光学, 2012, 33(6): 1128-1132.
shu
LIU Qing-long, YANG Chong-min, ZHANG Jian-fu, MI Gao-yuan, HAN Jun, JIN Ke. Numerical calculation for optical film-thickness distribution oflarge curvature spherical accessory[J]. Journal of Applied Optics, 2012, 33(6): 1128-1132.
Citation: LIU Qing-long, YANG Chong-min, ZHANG Jian-fu, MI Gao-yuan, HAN Jun, JIN Ke. Numerical calculation for optical film-thickness distribution oflarge curvature spherical accessory[J]. Journal of Applied Optics, 2012, 33(6): 1128-1132.
shu

大曲率球面零件光学膜厚分布数值计算

  • 西安应用光学研究所,陕西 西安 710065

详细信息
    通讯作者:

    刘青龙（1976-），男，陕西渭南人，工程师，主要从事光学镀膜方面的研究工作。 Email: lql3210@163.com

  • 中图分类号: TN205

Numerical calculation for optical film-thickness distribution oflarge curvature spherical accessory

  • Xi-an Institute of Applied Optics,Xi-an 710065,China

摘要

    摘要
  • 摘要: 为了对沉积在大曲率球面零件表面的光学膜厚分布进行理论分析计算，首先确定了工艺配置，然后通过数学建模确定出计算函数式，最后通过数值积分分别对蒸发源为点源（n=0）和蒸发源为面源(n=1，2)进行了计算。计算结果与实验结果比较后表明：在本文确定的工艺条件下，n=2时计算结果与实验结果比较吻合。证明采用本文设计的建模方法结合恰当的蒸发源发射特性，通过数值计算，完全可以对大曲率球面零件的膜厚分布进行计算。
    Abstract: In order to theoretically analyze and calculate the optical film-thickness distribution deposited on the surface of large curvature spherical accessory, we firstly determined the processing configuration, then determined the calculation function formula through mathematic model, finally carried out the calculation through numerical integration when the evaporation source was point evaporator (n=0) and plane evaporator (n=1, 2) respectively. Results of the calculation were compared with the experiment results. It is revealed that the calculation results when n=2 accord with the experiment results well under the processing conditions determined in this paper. It is also proved that the film-thickness deposited on the surface of large curvature spherical accessory can be calculated by numerical calculation adopting the designed modeling method and appropriate beam characteristics of evaporation source.
    • HTML全文
    • 参考文献(1)
  • ［1］卢进军，刘卫国. 光学薄膜技术［M］. 西安：西北工业大学出版社, 2005.
    LU Jin-jun, LIU Wei-guo. Optical thin film technology［M］. Xi-an: Northwestern Polytechnical University Press, 2005. (in Chinese)
    ［2］林永昌，卢维强. 光学薄膜原理［M］. 第一版. 北京：国防工业出版社, 1986.
    LIN Yong-chang, LU Wei-qiang. Principle of optical thin films［M］. 1st edition. Beijing: National Defense Industry Press, 1986. (in Chinese)
    ［3］潘栋梁，熊胜明，张云洞，等. 大口径镀膜机膜厚均匀性分析［J］. 应用光学, 2001, 22(1): 33-38.
    PAN Dong-liang, XIONG Sheng-ming, ZHANG Yun-dong, et al. Analysis on the film thickness uniformity of large caliber coating machine［J］. Journal of Applied Optics, 2001, 22(1): 33-38. (in Chinese with an English abstract)
    ［4］MUSSET A, STEVENSON I C. Thickness distribution of evaporated films［J］. SPIE, 1990, 1270: 287-291.
    ［5］宋健全，刘正堂，于忠奇，等. ZnS头罩增透保护膜系制备［J］. 红外与毫米波学报, 2001, 20(3): 203-206.
    SONG Jian-quan, LIU Zheng-tang, YU Zhong-qi, et al. Antireflective and protective films preparation on ZnS dome［J］. Journal of Infrared and Millimeter Waves, 2001, 20(3): 203-206. (in Chinese with an English abstract)
    ［6］HONG S, KIM E, BAE B S, et al. A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources［J］. Journal of Vacuum Science & Technology A: Vacuum, Surfaces and Films, 1996, 14(5): 2721-2727.
    ［7］李香波. 大口径基底镀膜均匀性研究［D］. 长春：中国科学院长春光学精密机械与物理研究所, 2008.
    LI Xiang-bo. Study on the deposition uniformity of large diameter base［D］. Changchun: Changchun Institute of Optical Precision Machinery and Physics, CAS, 2008. (in Chinese)
    ［8］阴晓俊，费书国，章月州，等. 有限元法计算膜厚均匀性［J］. 光学仪器, 2001, 23(56): 5-10, 5-10.
    YIN Xiao-jun, FEI Shu-guo, ZHANG Yue-zhou, et al. Simulating uniformity of film thickness with finite-cells method［J］. Optical Instrument, 2001, 23(56): 5-10, 5-10. (in Chinese with an English abstract)
    ［9］唐晋发，顾培夫，刘旭，等. 现代光学薄膜技术［M］. 杭州：浙江大学出版社, 2006.
    TANG Jin-fa, GU Pei-fu, LIU Xu, et al. Modern optical thin film technology［M］. Hangzhou: Zhejiang University Press, 2006. (in Chinese)
    ［10］封建湖，车刚明，聂玉蜂. 数值分析原理［M］. 北京：科学出版社, 2001.
    FENG Jian-hu, CHE Gang-ming, NIE Yu-feng. The principle of numerical analysis［M］. Beijing: Science Press, 2001. (in Chinese)
    • 相关文章
    • 施引文献
    • 资源附件(0)
计量
  • 文章访问数:  2903
  • HTML全文浏览量:  124
  • PDF下载量:  550
  • 被引次数: 0
出版历程
  • 刊出日期:  2012-11-14

目录

摘要
HTML全文
    参考文献(1)
    相关文章
    施引文献
    资源附件(0)

    /

    返回文章
    返回

    相关数据库

    广告合作

    友情链接

    帮助中心

    扫描关注本刊微信平台

    您是第  2908828位访问者，欢迎！

    地址: 西安市电子三路西段9号 邮政编码: 710065 联系电话: 029-88288172

    版权所有 © 《应用光学》编辑部

    陕公网安备 61011302001501号       陕ICP备19002862号-1

    北京仁和汇智信息技术有限公司 开发  技术支持: info@rhhz.net   百度统计