数字全息显微中相位像差校正技术综述

Review of phase aberration correction technology of digital holographic microscopy

  • 摘要: 数字全息显微技术是数字全息技术与显微技术的结合,兼备两种技术的优点,为微纳领域的定量三维测量提供了一种无损、无标记、准确和近实时的测量手段。然而,由于元件缺陷和失调以及环境扰动等原因,会在数字全息显微测量结果中额外引入相位像差。为了获得准确的定量相位测量结果,必须对像差成因和主要成分进行分析,然后补偿和校正像差。这篇综述介绍了数字全息显微成像测量中主要的像差来源和影响,基于实现的方式对现有的像差校正方法进行了综述,并展望了未来像差校正领域的发展方向,为从事数字全息检测研究的研究者提供参考。

     

    Abstract: Digital holographic microscopy is a combination of digital holography and microscopy, combining the advantages of both technologies, which provides a non-destructive, label-free, accurate and near real-time measurement method for quantitative 3D measurement in the micro-nano field. However, phase aberrations are additionally introduced due to component defects, misalignment, and environmental disturbances in the digital holographic microscopy measurement results. To obtain accurate quantitative phase measurement results, the origin and principal components of aberrations must be analyzed, and then compensate and corrected for aberrations. This review began with an introduction to the main sources and effects of aberrations in digital holographic microscopy imaging measurement. Then, the existing aberration correction methods were reviewed based on their different workflows and characteristics. Finally, the future development direction of aberration correction was prospected, which would provide useful references for researchers engaged in digital holographic detection research.

     

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