Athermalization and suppression of narcissus for medium-wave infrared optical system
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摘要: 为了得到性能好、稳定性高,能够满足民用、军事等领域应用的中波红外成像光学系统,采用光学被动式的无热化技术,在常温下像质良好的初始结构基础上,通过对不同红外材料组合,实现系统的无热化设计。利用等效温差(NITD)计算冷反射贡献量,对冷反射贡献量较大表面的曲率和光焦度进行优化。设计结果表明:在-40℃~60℃温度范围内,光学系统的MTF在30 lp/mm处均大于0.5;离焦量在一倍焦深以内,点列图(RMS)直径小于像元尺寸;冷反射残存量最大的表面NITD值降低40%。应用该方法可以很好地实现红外成像光学系统的无热化设计,对冷反射的抑制效果明显。Abstract: Infrared optical system is the core component of infrared imaging devices. Athermalization is widely adopted in mid-infrared optical design in order to improve performance and stability of infrared imaging optical systems, and meet performance requirements of civil and military applications. In this paper, passive athermalization design of a non-thermal mid-infrared imaging optical system is realized through combining different infrared materials. Contribution of narcissus is calculated by NITD method, curvature and optical power of surface with large contribution to narcissus are optimized. Results show that MTF of optical system is greater than 0.5 at 30 lp/mm in temperature range of -40 ℃ ~ 60 ℃, defocus distance is less than depth of light, RMS diameter is less than pixel size. Maximum NITD value of narcissus is reduced by 40%, which is smaller than minimum resolution temperature difference of the system. Application of this method can be very good to achieve athermalization design of infrared imaging optics system, and suppression effect of narcissus is obvious.
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Keywords:
- infrared optical design /
- thermal effect /
- athermalization design /
- narcissus
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表 1 光学系统的参数
Table 1 Parameters of optical system
参数 数值 工作波段/μm 3.7 ~4.8 F/# 2 焦距/mm 120 工作温度/℃ -40~60 视场角 对角线最大视场角3.9° 红外探测器参数 制冷型,640×512像元,单像元尺寸15 μm×15 μm 表 2 常用红外光学材料的折射率和热特性
Table 2 Refractive index and thermal characteristics of commonly used infrared optical materials
材料 折射率(@4 μm) dn/dt/(×10-6) 热膨胀系数/(×10-6/℃) Si 3.425 159 4.2 Ge 4.024 424 6.1 ZnS 2.252 43 7.0 ZnSe 2.433 63 7.5 表 3 不同材料组合的光学系统在-40℃和60℃的离焦量
Table 3 Defocus distance of optical system with different materials combination at -40℃ and 60℃
材料组合顺序 -40℃时离焦量/μm 60℃时离焦量/μm SiGeSiZs -60.24 40.35 SiGeZsSi -70.47 50.24 SiZsGeSi -16.35 12.48 ZsSiGeSi -57.58 45.37 表 4 无热化系统的冷反射分析结果
Table 4 Narcissus analysis of athermal optical system
表面序号 YNI I/Ibar 3 4.113 33 0.795 125 4 -8.638 61 1.343 549 5 -8.594 74 1.361 919 6 -0.463 68 0.607 239 7 8.732 94 0.808 685 8 8.059 04 0.799 190 9 -1.577 25 2.857 521 10 -5.355 62 1.134 264 表 5 系统不同温度下的光学离焦量
Table 5 Defocus of optical system under various temperatures
温度/℃ 离焦量/ μm -40 -15.17 20 0 60 8.78 -
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