Abstract: Electron rinse process is an effective way to improve the performance of microchannel plate (MCP).In view of the domestic electron rinse and test system only applied to the MCP with diameter of 30 mm and above at presents, an electron rinse and test system with 4 stations for largearea MCP (500 mm100 mm) was designed.In this system, the electron rinsing of MCP could be conducted on each station at the same time,and the parameters could be tested at one of the stations in the process of the electron rinsing at different stages.4 stations in the vacuum system could be converted to each other quickly.By emitting a uniform ultraviolet light on the gold cathode, the uniform electrons were generated, then an adjustable uniform electron beam could be obtained after uniform electrons being increased by standard MCP（105 mm）.Through vacuum, leakage detection and baking processes by several times,the time reaching the vacuum degree of 510-4 Pa was obtaind within 45 min, and the limit vacuum degree was better 510-4 Pa, which could meet the index requirement of rinsing and testing.For measuring the effect on the vacuum pumping difficulty of the vacuum system brought by the load, the factor K was defined in the experiment progress.Calculations show that the value of K was in the range of 0.35~1.57, and the positive proportion of factor K and pumping difficulty of the system was revealed.