缺陷对HfO2薄膜的激光弱吸收与损伤阈值的影响

刘浩, 潘峰, 卫耀伟, 马平, 张哲, 张清华, 吴倩

刘浩, 潘峰, 卫耀伟, 马平, 张哲, 张清华, 吴倩. 缺陷对HfO2薄膜的激光弱吸收与损伤阈值的影响[J]. 应用光学, 2015, 36(2): 314-320. DOI: 10.5768/JAO201536.0207004
引用本文: 刘浩, 潘峰, 卫耀伟, 马平, 张哲, 张清华, 吴倩. 缺陷对HfO2薄膜的激光弱吸收与损伤阈值的影响[J]. 应用光学, 2015, 36(2): 314-320. DOI: 10.5768/JAO201536.0207004
shu
Liu hao, Pan feng, Wei Yao-wei, Ma ping, Zhang Zhe, Zhang Qing-hua, Wu Qian. Influence of defects in HfO2 film on absorptance and LIDT measurements[J]. Journal of Applied Optics, 2015, 36(2): 314-320. DOI: 10.5768/JAO201536.0207004
Citation: Liu hao, Pan feng, Wei Yao-wei, Ma ping, Zhang Zhe, Zhang Qing-hua, Wu Qian. Influence of defects in HfO2 film on absorptance and LIDT measurements[J]. Journal of Applied Optics, 2015, 36(2): 314-320. DOI: 10.5768/JAO201536.0207004
shu

缺陷对HfO2薄膜的激光弱吸收与损伤阈值的影响

  • 中国工程物理研究院 激光聚变研究中心,四川 绵阳 621900

基金项目: 

中国工程物理研究院设备能力提升课题（2014B0409）

详细信息
    通讯作者:

    刘浩（1986-），男，湖北仙桃人，博士研究生，主要从事高功率激光器件研究。Email:liuhao_FOERC@aliyun.com

  • 中图分类号: TN244

Influence of defects in HfO2 film on absorptance and LIDT measurements

  • Research Center of Laser Fusion,CAEP, Mianyang 621900,China

摘要

    摘要
  • 摘要: 激光弱吸收是导致光学薄膜损伤的重要原因。在（5～43）mPa的氧分压下制备并测试了一组HfO2薄膜。实验发现，当氧分压小于20 mPa时，薄膜弱吸收越大，损伤阈值越低；当氧分压大于20 mPa时，薄膜的损伤阈值与弱吸收并不一一对应，具有较高弱吸收的薄膜可能同时具有较高的损伤阈值。建立了缺陷模型，采用有限元法模拟了缺陷对弱吸收测量和损伤阈值测量的影响，分析了缺陷尺寸、密度、吸收系数对弱吸收和损伤阈值的影响。研究结果显示，吸收系数高于薄膜1 000倍的缺陷可以降低薄膜的损伤阈值1 000倍，却并不影响薄膜的弱吸收。缺陷对HfO2薄膜的激光弱吸收与损伤阈值测试有完全不同的影响，是导致某些薄膜弱吸收与损伤阈值背离的原因。
    Abstract: The absorption is a main cause of laser damage in optical coatings. A group of HfO2 films were deposited under the oxygen pressure of 5 mPa~43 mPa. When pressure was less than 20 mPa, the films with higher absorptance had lower laser-induced damage threshold (LIDT); however, when pressure was larger than 20 mPa, this correlation did not exist anymore. Defects might be the cause of such phenomenon. Defect models were established to mimic the absorptance test and the LIDT test. The influence of defect size, defect density, defect absorptive coefficient on absorptance and LIDT was studied, and the mechanism was analyzed. It is found that those defects with 1 000 times higher absorptive coefficient can significantly decrease LIDT to as large as 1 000 times, but do not influence the absorptance test at all. This might explain that some films with high absorptance have even higher LIDT, and some films with low absorptance have even lower LIDT.
    • HTML全文
    • 参考文献(1)
  • [1]Stolz C J,  Thomas M D, Griffin A J. BDS thin film damage competition[J].SPIE,2008, 7132: 71320C.
    [2]Bercegol H.What is laser conditioning? A review focused on dielectric multilayers[J]. SPIE,1998, 3578: 421-426.
    [3]Krol H,Gallais L,Grezes-Besset C, et al. Investigation of nanoprecursors threshold distribution in laser damage testing[J]. Opt. Commu., 2005, 256: 184-189.
    [4]Rudolph W,Emmert L, Sun Z, et al. Laser damage in thin films—What we know and what we dont[J]. SPIE,2013, 8885: 888516.
    [5]Stuart B C, Feit M D, Herman S, et al. Nanosecond-to-femtosecond laser induced breakdown in dielectrics[J]. Phys. Rev. B 1996, 53: 1749-1761.
    [6]Wu Z L, Stolz C J, Weakley S C, et al. Damage threshold prediction of hafnia-silica multilayer coatings by nondestructive evaluation of fluence-limiting defects[J]. Appl. Opt., 2001, 40: 1897-1906.
    [7]Wu Z L, Stolz J C, Weakley S C, et al. Damage threshold prediction of hafnia-silica multilayer coatings by nondestructive evaluation of fluence-limiting defects[J]. Appl. Opt., 2001, 40(12): 1897-1906.
    [8]Willamowski U, Ristau D,Welsch E.Measuring the absolute absorptance of optical laser components[J]. Appl. Opt., 1998, 37: 8362-8370.
    [9]Liu H,Chen S L, Wei Y W, et al. Laser conditioning on HfO2 film monitored by calorimeter[J]. Opt. Express, 2012, 20: 698-705.
    [10]Liu Hao, Pan Feng, Chen Songlin. Measurement for bulk and surface absorptances of K9 substrates with laser calorimeter[J]. Journal of Applied Optics, 2014, 35(2): 292-296.
    刘浩, 潘峰, 陈松林. 激光量热法测量K9基片的表面吸收和体吸收[J].应用光学, 2014, 35(2): 292-296.
    [11]Jensen L O, Balasa I,Blaschke H, et al.Novel technique for the determination of hydroxyl distributions in fused silica[J]. Opt. Express,2009, 17: 17144-17149.
    [12]Ouyang Sheng, Liu Zhichao, Xu Qiao. Surface damage precursors in triple-frequency fused silica[J]. Journal of Applied Optics, 2011, 32(6): 1257-1262.
    欧阳升, 刘志超, 许乔. 三倍频熔石英激光损伤的吸收前驱体[J]. 应用光学, 2011,  32(6): 1257-1262.
    [13] Liu Zhichao, Wei Yaowei, Chen Songlin, et al. Characterization of 1 064 nm laser induced damage in ALD optical film[J]. Journal of Applied Optics, 2011, 32(2): 373-376).
    刘志超, 卫耀伟, 陈松林. ALD氧化铝单层膜1 064 nm激光损伤特性研究[J]. 应用光学, 2011, 32(2): 373-376.
    [14]Hu Haiyang, Fan Zhengxiu, Zhao Qiang. Measuring weak absorptance of thin film coatings by surface thermal lensing technique[J]. Acta Optica Sinica, 2001, 21(2): 150-154.
    胡海洋, 范正修, 赵强.表面热透镜技术探测光学薄膜的微弱吸收[J]. 光学学报, 2001,  21(2): 150-154.
    • 相关文章
    • 施引文献(5)

  • 期刊类型引用(2)

    1. 刘浩，马平，蒲云体，赵祖珍. 退火对EBE, IBS和ALD沉积HfO_2薄膜的抗激光损伤性能影响. 强激光与粒子束. 2020(07): 11-18 . 百度学术
    2. 李玉瑶，张婉怡，刘喆，李美萱，付秀华. S-on-1测量方式下薄膜激光损伤的累积效应. 激光技术. 2018(01): 39-42 . 百度学术

    其他类型引用(3)

    • 资源附件(0)
计量
  • 文章访问数:  2112
  • HTML全文浏览量:  137
  • PDF下载量:  205
  • 被引次数: 5
出版历程

目录

摘要
HTML全文
    参考文献(1)
    相关文章
    施引文献(5)
    资源附件(0)

    /

    返回文章
    返回

    相关数据库

    广告合作

    友情链接

    帮助中心

    扫描关注本刊微信平台

    您是第  2912924位访问者，欢迎！

    地址: 西安市电子三路西段9号 邮政编码: 710065 联系电话: 029-88288172

    版权所有 © 《应用光学》编辑部

    陕公网安备 61011302001501号       陕ICP备19002862号-1

    北京仁和汇智信息技术有限公司 开发  技术支持: info@rhhz.net   百度统计